> ÇÐȸ¼Ò°³ > ÇÐȸ»ó
Á¦ 1ȸ | 2012³â Ãá°è | Á¤Áö¿ø(¼¿ï´ëÇб³) - ³ª³ë¾ÐÀÔ½ÃÇèÀ» ÀÌ¿ëÇÑ ±Ý¼Ó ¹Ú¸·ÀÇ ±¹ºÎÀû ÀÜ·ùÀÀ·Â Æò°¡ |
2012³â Ãß°è | ÀÌÀº°æ(°æ»ó´ëÇб³) - Effect of Ti Addition on Tensile Properties of Cu-Ni-Si Alloys ÃÖÁö¾Ö(°í·Á´ëÇб³)- Microstructural and Electrochemical Properties of Ti-doped Al2O2 coated LicoO2 Films |
|
Á¦ 2ȸ | 2013³â Ãá°è | À̸íÁÖ(¾Èµ¿´ëÇб³) - Àú¿Â ºÐ»ç °øÁ¤À¸·Î Á¦Á¶µÈ Ta ÄÚÆÃÃþÀÇ Æ¯¼º¿¡ ¹ÌÄ¡´Â ¼Û±Þ °¡½ºÀÇ ¿µÇâ |
2013³â Ãß°è | ±èÀº¿µ(¼øõ´ëÇб³) - Effect of Initial Microstructure on Strain-Stress Partitioning and Void Formation in DP980 Steel During Uniaxial Tension ±¸Çý°æ(¼¼Á¾´ëÇб³) - Water-Splitting Performance of Cu-In-S Compounds/1D-Na2Ti6O13/FTO Photoelectrodes |
|
Á¦ 3ȸ | 2014³â Ãá°è | ¹Ú¹ÎÀç(¿ï»ê´ëÇб³)- À¯µµ°áÇÕÇöóÁ¸¦ ÀÌ¿ëÇÏ¿© ÁõÂøÇÑ TiAlSiN ¹Ú¸·ÀÇ ¹°¸®Àû Ư¼º ¿¬±¸ |
2014³â Ãß°è | ¹Ú°æ¹Ì(Àç·á¿¬±¸¼Ò) ÃÖÀº¹Ì(Áß¾Ó´ëÇб³) |
|
Á¦ 4ȸ | 2015³â Ãß°è | ÇÏÁÖ¿¬(Çѱ¹»ê¾÷±â¼ú½ÃÇè¿ø) ±è¼ö°æ(ºÎ»ê´ëÇб³) ÃÖ¼öÁö(°æºÏ´ëÇб³) |
Á¦ 5ȸ | 2016³â Ãß°è | ±èÁö¿ø (ÀÏÁø´ÙÀ̾Ƹóµå¢ß) °¹ÎÁÖ (Çö´ëÁß°ø¾÷ Áß¾Ó±â¼ú¿ø) ¹ÚÁö¼÷ (SKÇÏÀ̴нº) |
Á¦ 6ȸ | 2017³â Ãß°è | ¹è°æÀº (±¹¸³¾Ï¼¾ÅÍ) ¹ÚÁöÇý (Çѱ¹°úÇбâ¼ú¿¬±¸¿ø) Á¤È¿¸² (Àü³²´ëÇб³) |
Á¦ 7ȸ | 2018³â Ãß°è | ±è´ÙÇý (Ãæ³²´ëÇб³) ÀÌ¿¬ÁÖ (±¹¹Î´ëÇб³) ÃÖ¿ø¹Ì (Æ÷Ç×°ø°ú´ëÇб³) |
Á¦ 8ȸ | 2019³â Ãß°è | ±è¼öÇö (±¹¹Î´ëÇб³) ÀÌÀçÀº (¼¿ï´ëÇб³) Â÷¿¹Àº (Çѱ¹±³Åë´ëÇб³) |
Á¦ 9ȸ | 2020³â Ãß°è | Á¶¹Î¾Æ (¿ì¸²±â°è¢ß) Àå¹ÎÁö (»ï¼ºµð½ºÇ÷¹ÀÌ) ÁÖ¼ÒÀº (¿£½ºÆåÆ®¶ó) |
Á¦ 10ȸ | 2021³â Ãß°è | ÀÓÇö¾Æ(Çѱ¹Àç·á¿¬±¸¿ø) À̽½ºñ(Çѱ¹Àç·á¿¬±¸¿ø) ±ÇÁöÇý(SKÇÏÀ̴нº) |
Á¦ 11ȸ | 2022³â Ãß°è | ÀÌÇöÁö(Á¶¼±´ëÇб³) ±è¿ëÁÖ(Æ÷Ç×°ø°ú´ëÇб³) À̺¸¸§(»ï¼ºÀüÀÚ) |
Á¦ 12ȸ | 2023³â Ãß°è | ±è¼ÒÁø(±¹¸³¹®ÈÀ翬±¸¿ø) ÀÌÀ¯°æ(Çö´ëÁ¦Ã¶) °¼ÀÎ(Çѹç´ëÇб³) |
Á¦ 13ȸ | 2024³â Ãß°è | ÁøÀΰæ(¼øõ´ëÇб³) ±è¿ëÁÖ(Æ÷Ç×°ø°ú´ëÇб³) °³ª¿µ(È«ÀÍ´ëÇб³) |