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The Korean Institute of Metals and Materials

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Advanced Interconnects Technologies Using Atomic Layer Deposition (ALD) and Area-Selective ALD
15:30 – 15:50 Coffee Break
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Metal Thin Films for Advanced Interconnect Applications
16:30 – 17:10 ¿¬ÇÑ¿ï
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SMART Metallization for Precision Control of Mass and Heat Transport in Advanced Integrated Circuits
17:10 – 17:20 Discussion Session (¹ÝµµÃ¼ºÐ°ú ¹ßÀü ¹æÇâ Åä·Ð)
17:20 – 17:30 Closing Remark – ÃÖâȯ ¹ÝµµÃ¼ºÐ°ú À§¿øÀå
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