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14:00 – 14:10 |
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Opening Remark & ¹ÝµµÃ¼ºÐ°ú ¼Ò°³ |
14:10 – 14:50 |
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ÀÌÁ¾ÁýÀû ÆÐÅ°Áö¿¡¼ Àç¹è¼± ¹× ÇÏÀ̺긮µå º»µù ±â¼ú À̽´ |
14:50 – 15:30 |
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(UNIST) |
Advanced Interconnects Technologies Using Atomic Layer Deposition (ALD) and Area-Selective ALD |
15:30 – 15:50 |
Coffee Break |
15:50 – 16:30 |
ÀÌ»ó¿î
(¾ÆÁÖ´ë) |
Metal Thin Films for Advanced Interconnect Applications |
16:30 – 17:10 |
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(GIST) |
SMART Metallization for Precision Control of Mass and Heat Transport in Advanced Integrated Circuits |
17:10 – 17:20 |
Discussion Session (¹ÝµµÃ¼ºÐ°ú ¹ßÀü ¹æÇâ Åä·Ð) |
17:20 – 17:30 |
Closing Remark – ÃÖâȯ ¹ÝµµÃ¼ºÐ°ú À§¿øÀå |
17:30 – |
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