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The Korean Institute of Metals and Materials

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Á¦  ¸ñ 2015³âµµ Ãá°èÇмú´ëȸ ¿ì¼öÆ÷½ºÅÍ»ó ¼ö»óÀÚ °ø°í(ÃÑ32¸í)
ÀÛ¼ºÀÚ ¹æ°¡³ª »ç¿ø µî·ÏÀÏ 2015-04-27 À̸ÞÀÏ mmi@kim.or.kr Á¶È¸¼ö 5614

Áö³­ 4¿ù 22ÀÏ~24ÀÏ Ãá°èÇмú´ëȸ¿¡¼­ ¹ßÇ¥ÇÑ 512ÆíÀÇ Æ÷½ºÅÍ ¹ßÇ¥ Áß ½É»ç¸¦ ÅëÇÏ¿© ¾Æ·¡ ÃÑ 32°ÇÀÇ ¹ßÇ¥¿¡ ´ëÇÏ¿© 2015³âµµ Ãá°èÇмú´ëȸ ¿ì¼öÆ÷½ºÅÍ»óÀ» ½Ã»óÀÚ·Î ¼±Á¤µÇ¾ú±â¿¡ ´ÙÀ½°ú °°ÀÌ ¿ì¼öÆ÷½ºÅÍ»ó ¼ö»óÀÚ¸¦ °ø°í ÇÕ´Ï´Ù.  ¿ì¼öÆ÷½ºÅÍ»ó ¼ö»óÀÚ ºÐ²²´Â »óÀå ¹× ºÎ»óÀ¸·Î »ó±Ý 10¸¸¿øÀ» ¼ö¿©ÇÒ ¿¹Á¤ÀÔ´Ï´Ù. (¼ö»óÀÚ ºÐ²²´Â °³º°ÀûÀ¸·Î ÇÐȸ »ç¹«±¹¿¡¼­ ¿¬¶ôµå¸± ¿¹Á¤ÀÔ´Ï´Ù.)



P1-7

¼±ÅÃÀû ÷°¡¿ø¼Ò¿¡ µû¸¥ TiZrHfNiCu ÇÏÀÌ¿£Æ®·ÎÇÇ ÇÕ±Ý °³¹ß ¹× Ư¼º º¯È­

¹ÚÇýÁø1, ±è¿µ¼®1, È«¼ºÈ¯1, ±èÁ¤ÅÂ1, ¹ÚÁø¸¸2, ±è±â¹ü1,*

1¼¼Á¾´ëÇб³ °ø´ë ³ª³ë½Å¼ÒÀç°øÇкÎ. 2»ï¼ºÀüÀÚ.


P1-29

¿ëÁú¿ø¼ÒÀÇ ¿£Æ®·ÎÇÇ Áõ°¡ ¹æÇâÀ¸·Î ÇÕ±ÝÈ­¸¦ ÅëÇÑ Al°è ºñÁ¤Áú ÇÕ±ÝÀÇ ¿­ÀûƯ¼º Çâ»ó

±è¿Ï1, ÀÌÁ¦ÀÎ1, ¹ÚÀº¼ö1

1¼­¿ï´ëÇб³ Àç·á°øÇкΠ½Å¼ÒÀç°øµ¿¿¬±¸¼Ò.


P1-35

ö°è ºñÁ¤Áú ¸®º»ÀÇ »êÈ­°Åµ¿ ¹× ³»È­¹°°úÀÇ ¹ÝÀÀ¼º¿¡ ´ëÇÑ ¿¬±¸

À±¼º±Ç1, À̽ÂÈÆ1

1°æºÏ´ëÇб³½Å¼ÒÀç°øÇкÎ.


P2-6

¿­ÇÇ·Î ½ÃÇèÀ» ÅëÇÑ º»µåÄÚÆà Á¾·ù¿¡ µû¸¥ ¿­Â÷Æó ÄÚÆÃÀÇ ¿­Àû³»±¸¼º Æò°¡

ÃÖ°èÁ¤1, ¿©Ã¶1, ¸í»ó¿ø1, ÀÌÀçÇö1, Á¤¿¬±æ1

1â¿ø´ëÇб³ ³ª³ë½Å¼ÒÀç°øÇкÎ.


P2-27

Squeeze infiltration ÁÖÁ¶¹ý¿¡ ÀÇÇÑ CNT °­È­ Mg º¹ÇÕÀç·á Á¦Á¶½ÃÀÇ °øÁ¤ ÀÎÀÚ ºÐ¼®

Á¶´ëÇö1, À̺´¿ì1, ³²ÁöÈÆ1, ¹ÚÀ͹Î1

1ºÎ»ê´ëÇб³.


P3-7

Sn ³» Na È®»ê¿¡¼­ÀÇ Ãʱâ Å©±â ¹× °áÁ¤ ¹èÇâÀÌ ¹ÌÄ¡´Â ¿µÇâ Ž±¸

º¯¿µ¿î1,2, ¼­Á¾Çö2, ÀÌÁö¿µ2, ¾ÈÀçÆò2*, ÀÌÀçö1*

1°í·Á´ëÇб³ ½Å¼ÒÀç°øÇаú. 2Çѱ¹°úÇбâ¼ú¿¬±¸¿ø Ư¼ººÐ¼®¼¾ÅÍ.


P3-32

Hydrogen Storage Properties of Ti/Mg/Ti/Pd Multilayer Thin Film with Various Film Thicknesses

Hwaebong Jung1, Sungmee Cho2, Wooyoung Lee1

1Department of Materials Science and Engineering. 2Yonsei Univ.


P4-7

Influence of ZrO2 Incorporation into Coating Layer on Electrochemical Response of Low-carbon Steel Processed by Electrochemical Plasma Coating

Gye Won Kim1, Ki Ryong Shin1, Yeon Sung Kim1, Young Gun Ko2, Dong Hyuk Shin1

1Hanyang University. 2Yeungnam University.


P4-27

ÀÓ°è°ø½Ä¿Âµµ¸¦ ÀÌ¿ëÇÑ ½ºÅ×Àθ®½º°­ÀÇ ÇؼöºÎ½Ä¿¡ ´ëÇÑ ¼ö¸í¿¹Ãø

Á¶Çö¿ì1, ±è¿µ½Ä1

1±¹¸³¾Èµ¿´ëÇб³ °ø°ú´ëÇÐ ½Å¼ÒÀç°øÇкÎ.


P5-12

¼öÁß ¹æÀüÀ» ÅëÇÑ Æȶóµã ³ª³ëÀÔÀÚÀÇ Å©±â Á¦¾î ¹× ±×¿¡ µû¸¥ Àü±âÈ­ÇÐÀû Ã˸ŠƯ¼º Æò°¡

ÀÌ»óÀ²1, Á¶À¯±Ù1, ±è¼º¹Î1, ±èÁ¤¿Ï2

1Çѱ¹Ç×°ø´ëÇб³ Ç×°øÀç·á°øÇаú. 2ÀÎõ´ëÇб³ »ý¸í°øÇаú.


P5-32

Fast self-assembly of pristine large-area graphene film

À±Å¿µ1, ½ÉÁ¾¿ø1, ±è»ó¿í1

1Çѱ¹°úÇбâ¼ú¿ø ½Å¼ÒÀç°øÇаú.

P6-10

Self assembled Layer-by-Layer ÃþÀ» ÀÌ¿ëÇÑ TSV sidewallÀÇ °ÅÄ¥±â °¨¼Ò

Á¤´ë±Õ1, ¾çÈñö1, Â÷ÇÊ·É1, ÀÌÀç°©1

1±¹¹Î´ëÇб³ °ø°ú´ëÇÐ ½Å¼ÒÀç°øÇкÎ.


P7-8

°èÀåÈ­¾ÐÀÔ¹ý°ú À¯ÇÑ¿ä¼ÒÇؼ®À» ÀÌ¿ëÇÑ AZ31 ¸¶±×³×½· ÇÕ±ÝÀÇ º¯ÇüÀ² ¼Óµµ¹Î°¨µµ ȹµæ

À±ÀçÀÍ1, Á¤ÇõÀç1, °­¼ºÈÆ2, ÀÌÈ£¿ø2, ±èÇü¼·1

1Æ÷Ç×°ø°ú´ëÇб³ ½Å¼ÒÀç°øÇаú. 2Àç·á¿¬±¸¼Ò.


P8-2

Mg-Al°èÀÇ ¾ÐÃâ Á¶°Ç¿¡ µû¸¥ ¹Ì¼¼Á¶Á÷ ¹× ±â°èÀû Ư¼º

Á¶ÅÂÈñ1, Á¤¼®È¯1, ±è¿ëÁÖ1, ±è¿øÅÂ2, ±èµµÇâ1

1¿¬¼¼´ëÇб³ ½Å¼ÒÀç°øÇаú. 2ûÁÖ´ëÇб³ ·¹ÀÌÀú±¤Á¤º¸°øÇаú.


P9-11

ŸÀÌŸ´½ ÇÕ±ÝÀÇ À¯µ¿¼º ¹× ±Ý¼Ó-ÁÖÇü¹ÝÀÀ¼º¿¡ °üÇÑ ¿¬±¸

±è¿ø´ö1, ±è½Â¾ð1, ¹ÚÁö¿ø1, ³ª¿µ»ó1, Çö¿ëÅÃ1, ¿Àâ¼®1, ÀÌÇмº1, ±è¼º¿õ1, °­ÁÖÈñ1, °­Ã¢·æ2

1Àç·á¿¬±¸¼Ò(KIMS). 2ºÎ°æ´ëÇб³.


P10-2

ÀÏ»êÈ­Áú¼Ò(Nitric Oxide, NO)¸¦ »ýºÐÇؼº ÀÓÇöõÆ®¿¡ Àû¿ëÇϱâ À§ÇÑ ºÎ½Ä ¹× µ¶¼º Æò°¡

ÀüÁø°æ1, ±è¿øÁÖ2, ±è±â¹ü3, ½ÅÀçÈ£3, ÇÑÇü¼·2, ¹ÚÁö¹Î2, ÃÖÁ¾ÈÆ2, ±èÀ¯Âù2, ¼®Çö±¤2, À̼±Èñ4, ¿Á¸í·Ä2

1°úÇбâ¼ú¿¬ÇÕ´ëÇпø´ëÇб³. 2Çѱ¹°úÇбâ¼ú¿¬±¸¿ø »ýüÀç·á¿¬±¸´Ü. 3±¤¿î´ëÇб³ È­Çаú. 4U £¦ I¢ß.

P11-9

ÀÚµ¿Â÷¿ë °í°­µµ, °í¿¬¼º Al-Mg°è ¾Ë·ç¹Ì´½ ÇÕ±ÝÀÇ ÁÖÁ¶¼º ¹× °¡°ø¼º Æò°¡

ÀÌÀ±¼ö1, ±è¿øÀç1, Á¶µ¿¾Æ1, Â÷ÁØÇö1, ±è¼öÇö1, ±èÇü¿í1, ÀÓÂ÷¿ë1

1Àç·á¿¬±¸¼Ò.


P11-27

»êÈ­±¸¸®ºÐ¸»ÀÇ È²»êħÃ⠰ŵ¿

¹ÚÀÏȯ1, À¯°æ±Ù1, ±èº´¼ö2

1Çѱ¹Çؾç´ëÇб³. 2Çѱ¹ÁöÁúÀÚ¿ø¿¬±¸¿ø.


P11-32

Æó¾×À¸·ÎºÎÅÍ PC-88A¿Í D2EPHA¸¦ ÀÌ¿ëÇÑ ¸ô¸®ºêµ§ÀÇ È¸¼ö ¿¬±¸

±èÁöÇý1, ÀÓä¼±1, ÀÌÁ¤¼®1

1¢ßÆ÷½ºÄÚ¿¥ÅØ.


P11-67

±¸¸® ¸ÞÅ»Æû-¾Ë·ç¹Ì´½ ÁÖÁ¶ º¹ÇÕÀçÀÇ °è¸éƯ¼º

±è³²ÈÆ1, ±èÁ¤¹Î1, °í¼¼Çö2

1Çѹç´ëÇб³. 2Çѱ¹»ý»ê±â¼ú¿¬±¸¿ø.


P12-12

źÀç³»Àå ö±¤¼® ºê¸®ÄÏÀÇ È¯¿ø ÇÁ·Î¼¼½º Àû¿ëÀ» À§ÇÑ ±â°èÀû Ư¼º ¿¬±¸

±è°­¹Î1, ±ÇÀÇÇõ1, À̱â¿ì1, ±ÇÀçÈ«1, ÀÌÁؼ­1, ÇÑÁ¤È¯1

1ÀÎÇÏ´ëÇб³ ½Å¼ÒÀç°øÇаú.


P12-28

Àúź¼Ò°­ÀÇ Ãæ°ÝÀμº°ú ¿¬¼º-Ã뼺 õÀÌ ¿Âµµ¿¡ ¹ÌÄ¡´Â ÆÞ¶óÀÌÆ®ÀÇ Ãþ»ó°£°ÝÀÇ ¿µÇâ

ÀÌ»óÀÎ1, °­ÁØ¿µ1, ¿À¼±±Ù1, ÀÌ»óÀ±2, ÀÌÀç½Â2, À¯Àå¿ë2, Ȳº´Ã¶1

1¼­¿ï°úÇбâ¼ú´ëÇб³. 2Æ÷½ºÄÚ ±â¼ú¿¬±¸¿ø.


P12-40

Àü±â·Î ½½·¡±× Áß FeO ȯ¿ø°Åµ¿ ¹× Fe ȸ¼öÀ²¿¡ ¹ÌÄ¡´Â Al ÷°¡ÀÇ ¿µÇâ

ÇãÁ¤È£1, ȲÁøÀÏ2, ¹ÚÁÖÇö1

1ÇѾç´ëÇб³. 2Çö´ëÁ¦Ã¶.


P13-6

Finite Element Analysis of Micro-pore Clustering Effect on Mechanical Properties of Sintered Porous Metals

Yi Je Cho1, Yong Guk Son1, Jeong-Jung Oak1, Yong Ho Park1

1Pusan National University.


P13-31

±¸¸® ³ª³ë ÀÔÀÚÀÇ »êÈ­¸¦ ¹æÁöÇϱâ À§ÇÑ 1-Octanethiol ÄÚÆà ¹× GrapheneÀ» ÄÚÆà ±â¼úÀ» ÀÌ¿ëÇÏ¿© Á¦ÀÛµÈ À×Å©¸¦ ÀÌ¿ëÇÑ À×Å©Á¬ ÇÁ¸°Æà Ư¼ºÆò°¡

¼Õ¿¬È£1, Ç¥¿µÁØ1, ÃÖ´ÙÇö1, À±ÀÇÇÑ2, ±è¿ëÀÏ3, Á¤½ÂºÎ3, À̼±¿µ1

1ÇѾç´ëÇб³ Àç·á°øÇаú. 2´ëâ ±â¼ú¿¬±¸¼Ò. 3¼º±Õ°ü´ëÇб³.


P14-3

Controllable p-type Doping in Organic Semiconductor in Field Effect transistors

Ko Museok1, Lee mijung1

1Kookmin university.


P15-3

NÇü Bi2Te3-ySey:Dm °í¿ëüÀÇ µµÇÎ ¹× ¿­ÀüƯ¼º

ÀÌ°íÀº1, ±èÀÏÈ£1, ÀÓ¿µ¼ö2, ¼­¿ø¼±2, ÃÖº´ÁØ3, Ȳâ¿ø3

1Çѱ¹±³Åë´ëÇб³. 2Çѱ¹¼¼¶ó¹Í±â¼ú¿ø. 3¢ßÁ¦Æç.


P16-15

Novel Strengthening of Grain Boundary for Enhancement of Creep Resistance of Alloy 617 at 950¡ÆC.

ÀÌÁö¿ø1, È«Çö¿í1,*

1â¿ø´ëÇб³.


P17-10

CM247LC ÀϹæÇâ Ãʳ»¿­Çձݿ¡¼­ °áÁ¤¸³ ¹æÇâ¿¡ µû¸¥ °í¿Â»êÈ­ °Åµ¿

±èâÈñ1, ÁÖÀ±°ï1, È«Çö¿í1, ÀÌÀçÇö1, ±Ç¼®È¯2, À±º´°ü2

1â¿ø´ëÇб³. 2Çѱ¹·Î½ºÆ®¿Î½º¢ß.


P18-5

YS 600MPa±Þ FCA ¿ëÂø±Ý¼ÓÀÇ ¹Ì¼¼Á¶Á÷°ú Æí¼®ÀÌ Àú¿Â±Õ¿­¿¡ ¹ÌÄ¡´Â ¿µÇâ

À̸íÁø1, ÀÌÁ¤ÈÆ1, Á¶°æ¸ñ1, À¯»ó±Ù2, ±è¿ë´ö2, °­³²Çö1

1ºÎ»ê´ëÇб³ Àç·á°øÇаú. 2Çö´ëÁ¾ÇձݼÓ.


P19-6

¸®ÇÃ·Î¿ì °øÁ¤¿¡ ÀÇÇÑ Cu Çʶó ¼Ö´õ ¹üÇÁÀÇ Çü»óº¯È­ °íÂû

±è»óÇõ1, ½ÅÇѱÕ1, ÀÓÇöÈ£1, ¹Úä¹Î1, ±èµ¿¿í2, Â÷ÇÊ·É2, ÀÌÀÇÇü3, ÀÌÈ¿Á¾1

1µ¿¾Æ´ëÇб³ °ø°ú´ëÇÐ ½Å¼ÒÀç°øÇаú. 2±¹¹Î´ëÇб³ °ø°ú´ëÇÐ ½Å¼ÒÀç°øÇаú.

3»ï¼ºÀüÀÚ ¹ÝµµÃ¼»ç¾÷ºÎ ¸Þ¸ð¸®T±â¼úÆÀ.


P20-5

3Ãþ ÀûÃþÀç R-valueÀÇ À¯ÇÑ¿ä¼ÒÇؼ®

¹é½Â¹Ì1, ±èÁ¤±â1, ¹Úº´È£1, ±èÇü¼·1

1Æ÷Ç×°ø°ú´ëÇб³.

º¯¿µ¿î1,2, ¼­Á¾Çö2, ÀÌÁö¿µ2, ¾ÈÀçÆò2*, ÀÌÀçö1*

 
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