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EBSD1
Advanced Applications of EBSD
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EBSD1-1
13:00-13:15
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EBSD1-2
13:15-13:30
Lamellar ±¸Á¶ÀÇ ±¸¸®µµ±Ý ¹Ú¸·ÀÇ Á¦ÀÛ ¹× ±â°èÀû ¹°¼º Æò°¡  
½ÅÇѱÕ, ±è»óÇõ(µ¿¾Æ´ëÇб³ °ø°ú´ëÇÐ ±Ý¼Ó°øÇаú), ¹ÚÇö(¸®³ì½º(ÁÖ)), ÀÌÈ¿Á¾(µ¿¾Æ´ëÇб³ °ø°ú´ëÇÐ ±Ý¼Ó°øÇаú)
EBSD1-3
13:30-13:45
Àº µµ±Ý ½ºÅ×Àθ®½º°­ °üÀÇ ¼Ò¼º°¡°ø ¹× ¿­Ã³¸®¿¡ ÀÇÇÑ ¹Ì¼¼Á¶Á÷°ú ÁýÇÕÁ¶Á÷  
¹ÚÇö(¸®³ì½º(ÁÖ)), ÀÌ¿ìÁø(µ¿¾Æ´ëÇб³ °ø°ú´ëÇÐ ±Ý¼Ó°øÇаú), ¼ÕÀçÇÑ(¸®³ì½º(ÁÖ)), ½ÅÇѱÕ(µ¿¾Æ´ëÇб³ °ø°ú´ëÇÐ ±Ý¼Ó°øÇаú), õÀÓÁ¤, È«¼º±Ô(¸®³ì½º(ÁÖ)), ÀÌÈ¿Á¾(µ¿¾Æ´ëÇб³ °ø°ú´ëÇÐ ±Ý¼Ó°øÇаú)
EBSD1-4
13:45-14:00
Investigation of microstructural evolution of deposited Cu thin films depending on the deposition methods : e-beam evaporation and sputtering
MinJi Kim, Sukbin Lee(¿ï»ê°úÇбâ¼ú¿ø(UNIST))
EBSD1-5
14:00-14:15
Investigating the Crystallographic Microstructure of Cu Electrodeposits in Through Silicon Via by EBSD
ÀÌÈ¿Á¾, ±è»óÇõ(µ¿¾Æ´ëÇб³ °ø°ú´ëÇÐ ½Å¼ÒÀç°øÇаú), Daniel Josell, Thomas P. Moffat(Materials Science and Engineering Division NIST)